Application Field
MOCVD Heater
Field Introduction
Metal organic compound vapor deposition (MOCVD) equipment is a key core equipment in the field of LED semiconductor epitaxy, with the heater being one of its core components. MOCVD is a chemical vapor deposition technology that utilizes organometallic decomposition reactions for the vapor-phase epitaxial growth of thin films. To grow multi-component, large-area, thin-layer and ultra-thin-layer compound semiconductor materials, in addition to system tightness, flow rate and rapid composition change, the temperature control of the reaction chamber is the most important consideration for MOCVD equipment. The temperature control accuracy of the MOCVD chamber should reach 0.2°C or higher, with high temperature field uniformity also an important guarantee for product yield. Our high-performance materials, such as tungsten, molybdenum, rhenium, and ceramics, are all key materials for core heater components such as heating wires, heat shields, and conductive columns.
Advantages
We have been researching MOCVD heaters since 2007, and have formed strategic partnerships with many international and domestic equipment manufacturers to jointly develop MOCVD equipment. At present, ATTLMOCVD heater components have been used in large quantities in epitaxial equipment operating around the world.
Address:Area C, AT&M, No. 10 North Yongcheng Road, Yongfeng Industrial Base, Haidian District, Beijing, China / No. 10 Baozhong Road, Baodi Economic and Development Zone, Tianjin, China
Tel: +86 (0)10 5871-7301 / +86 (0)22 5921-3388
International Trade: +86 18892203868 / anne@attl.cn
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ATTL Advanced Materials Co.,Ltd.